DE400D E-BEAM 美国实验室DE400D 电子束蒸发真空镀膜仪
产品简介
of the chamber and rotary or on the horizontal axial on the side of chamber for the sub
详细信息
Configuration
主要配置
| Evaporation Chamber 蒸发腔体 | 304 stainless steel chamber with viewport 蒸发腔体为304不锈钢，并有观察窗 |
| Vacuum Pumping 真空泵 | Cryo-pump or Turbo pump and dry rough pump 配备冷凝泵或分子泵和无油机械泵 |
| Vacuum Valve 真空阀门 | Pneumatic HV gate valves 气动控制高真空插板阀 |
| Evaporation Source 蒸发源 | Multi pocket e-beam source 多坩埚电子束蒸发源 |
| Optional Load Lock chamber 样品室 | 304 stainless steel chamber with viewport 蒸发腔体为304不锈钢，并有观察窗 |
| Sample Stage 样品台 | Top mount and rotary or Side mount polar Substrate 顶部安装旋转的样品台或侧面安装的转角样品台 |
| Film Control 膜厚检测 | Crystal Film thickness Monitor and Control 晶振膜厚监控 |
| Vacuum Gauging 真空测量 | Wide range vacuum gauge and rough gauge 宽量程真空计用于测量真空和粗抽计 |
Specification
主要技术指标
| The Base Vacuum Pressure 极限真空度 | better than 5E-8 Torr 优于5E-8托 |
| Sample Loading Capacity 装样能力 | One Max. 8 inch flat substrate or multi small substrate 一个zui大8英寸的平板基片或多个小基片 |
| Rate Resolution 蒸发速率分辨率 | 0.05 Angstroms/sec |
| Thickness Resolution = 0.02 Angstroms 膜厚分辨率 | 0.02 Angstroms
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| Features 特点
D shape Chamber of front open door for easy inside operation D型腔体前开门便于腔体内部操作和维护
Stand along system frameworks and electric rack 独立的系统机架和电器柜
System and e-beam source Water Interlock 系统和电子束蒸发源冷水安全互锁
Optional Substrate Cooling or heating 样品台可选水冷或加热
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Typical Application
典型应用
For R&D Thin Film Deposition
用于薄膜沉积研发
Ideal tools for LIFT-OFF process
用于LIFT-OFF工艺的理想平台
Ideal tools for GLAD process with side mount substrate stage
若采用侧装样品台可用成为GLAD工艺的理想平台
Evaporate metal, Semiconductor or Insulation Materials （material depends）
可蒸发金属，半导体或介质材料（视具体材料而定）
Evaporate Magnetic Materials
可蒸发磁性材料