DE200 PLD 美国实验室DE200脉冲激光薄膜沉积系统
产品简介
详细信息
- 超高真空脉冲激光沉积腔室
- 超高真空STM腔室
- 超高真空样品操纵台
- 多靶转台
- 预真空进样室
PLD Components
PLD substrate manipulator with 2" quartz lamp heater and gas shower ring.
We offers an extensive line of substrate and target manipulators as well as load lock and sample transfer systems for PLD systems. Our standard modular components can be configured in a variety of ways to meet your specific PLD system design. We can also design, integrate and certify complete PLD systems.
Typical Manipulator Specifications
| Orientation | Vertical or Horizontal |
| X-Y movement | ±0.5" or ±1.0" |
| Substrate sample | size <2" diameter |
| Targets | 6 - 1" （other configurations available） |
| Sample orientation | any |
| Sample heating | SHQ to 700°C （water-cooled heater） |
| Vacuum environment | UHV, O2 |
| In-vacuum sample transfer | optional |
| Base flange | 8" |