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实验室常用设备其它实验室常用设备镀膜机

DE200 PLD 北京高校光学实验室DE200脉冲激光薄膜沉积系统

供应商:
德仪科技有限公司
企业类型:
代理商

产品简介

德仪科技有限公司专业进口美国磁控溅射、电子束蒸发、热蒸发和脉冲激光真空薄膜沉积设备,以及磁控溅射源/电源、电子束蒸发源、溅射靶材和蒸发材料等。十几年来,凭着的品质,*的技术和周到的技术服务,德仪公司的产品为中国的高校、科研院所及企业的薄膜沉积工作提供了有力的支持。

我们期待为您提供您使用的真空薄膜沉积设备和部件!

详细信息


  •  
  • 超高真空脉冲激光沉积腔室
  • 超高真空STM腔室
  • 超高真空样品操纵台
  • 多靶转台
  • 预真空进样室

Typical PLD System Configuration and Variations

1. Typical PLD Configuration
The substrate and target are introduced through a load lock chamber opposite the target gearbox. The substrate is then rotated on its polar axis to face the target gearbox. The substrate can be moved out of the way for transfer of the targets. This is one of the most common and economical configurations.

Typical PLD configuration, vertically-mounted substrate manipulator

Typical PLD substrate manipulator with 2" quartz lamp heater

Typical PLD target manipulator, horizontal mount, STLC target system

2. Vertical PLD Configuration
This design features up-facing, gravity-held target holders to accommodate liquid, powder, or conventional targets. A custom transfer fork moves substrates and targets into place via standard load lock chamber.

3. Simple PLD Configuration
This design offers basic substrate and target devices with no XY or Z adjustment. Substrate and target changes are done at atmosphere.

4. Multi-Purpose PLD Configuration
This design permits MBE growth, via bottom-flange-mounted evaporation sources, as well as PLD growth. Substrate assembly faces the side of the chamber for PLD, the bottom for MBE, and the other side for in-vacuum transfer of substrates.

PLD Components

PLD substrate manipulator with 2" quartz lamp heater and gas shower ring.

We offers an extensive line of substrate and target manipulators as well as load lock and sample transfer systems for PLD systems. Our standard modular components can be configured in a variety of ways to meet your specific PLD system design. We can also design, integrate and certify complete PLD systems.

Typical Manipulator Specifications

 

Orientation Vertical or Horizontal
X-Y movement ±0.5" or ±1.0"
Substrate sample size <2" diameter
Targets 6 - 1" (other configurations available)
Sample orientation any
Sample heating SHQ to 700°C (water-cooled heater)
Vacuum environment UHV, O2
In-vacuum sample transfer optional
Base flange 8"

 

 

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